Plasma processor for large workpieces

Details Plasma processor for large workpieces Plasma processor for large workpieces

1994-12-06

1996-12-31

Pascal, Robert

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511151, 31511171, 21912152, 21912143, H01J 724

Patent

active

055897371

ABSTRACT:
A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.

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