Plasma processing method

Details Plasma processing method Plasma processing method

2011-01-25

2011-01-25

Meeks, Timothy H (Department: 1715)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C427S569000

Reexamination Certificate

active

07875322

ABSTRACT:
Pulsated microwaves are supplied to a wave guide tube from a microwave generation unit through a matching circuit. The microwaves are supplied through an inner conductor to a planar antenna member. The microwaves are radiated from the planar antenna member through a microwave transmission plate into space above a wafer within a chamber. An electromagnetic field is formed in the chamber by pulsated microwaves radiated into the chamber from the planar antenna member through the microwave transmission plate, turning an Ar gas, H2gas and O2gas into plasma to form an oxide film on the wafer.

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Englsih Abstract of JP0315870A, Tamahashi.

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