Plasma-inert cover and plasma cleaning process and apparatus emp

Details Plasma-inert cover and plasma cleaning process and apparatus emp Plasma-inert cover and plasma cleaning process and apparatus emp

1996-06-10

1998-09-22

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

Work support

118500, 156345, C23C 1600, C23F 102

Patent

active

058109366

ABSTRACT:
A apparatus for removing deposits from within a space at least partially delimited by a surface which is subject to attack from a plasma including a surface cover comprising a material which is inert to the plasma.

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Anon., "Thermalloy Conductive Electrical Isolation Wafer," Derwent Publications Ltd., London; Class L03, AN 89-098219, Abstract and Research Disclosure, vol. 298, No. 043, 10 Feb. 1989, Emsworth, GB.

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