Plasma immersion ion implantation process

Details Plasma immersion ion implantation process Plasma immersion ion implantation process

2005-01-28

2008-12-16

Padgett, Marianne L (Department: 1792)

Coating processes

Direct application of electrical, magnetic, wave, or...

Ion plating or implantation

C427S526000, C427S527000, C427S530000, C427S563000, C427S562000, C427S564000, C427S569000, C427S570000, C427S578000, C427S574000, C427S573000, C427S534000, C427S490000, C438S766000, C438S906000

Reexamination Certificate

active

07465478

ABSTRACT:
A method of processing a workpiece includes placing the workpiece on a workpiece support pedestal in a main chamber with a gas distribution showerhead, introducing a process gas into a remote plasma source chamber and generating a plasma in the remote plasma source chamber, transporting plasma-generated species from the remote plasma source chamber to the gas distribution showerhead so as to distribute the plasma-generated species into the main chamber through the gas distribution showerhead, and applying plasma RF power into the main chamber.

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