Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2006-11-21
2006-11-21
Hassanzadeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S7230IR, C156S345350, C156S345380
Reexamination Certificate
active
07137354
ABSTRACT:
A plasma immersion ion implantation reactor for ion implanting a species into a surface layer of a workpiece includes an enclosure which has a side wall and a ceiling defining a chamber and a workpiece support pedestal within the chamber having a workpiece support surface facing the ceiling and defining a process region extending generally across the wafer support pedestal and confined laterally by the side wall and axially between the workpiece support pedestal and the ceiling. The enclosure has at least a first pair of openings at generally opposite sides of the process region and a first hollow conduit outside of the chamber having first and second ends connected to respective ones of the first pair of openings, so as to provide a first reentrant path extending through the conduit and across said process region. A gas distribution apparatus is provided on or near an interior surface of the reactor for introducing a process gas containing the species to be ion implanted and a first RE plasma source power applicator for generating a plasma in the chamber.
REFERENCES:
patent: 2344138 (1944-03-01), Drummond
patent: 3109100 (1963-10-01), Gecewicz
patent: 3576685 (1971-04-01), Swann et al.
patent: 3907616 (1975-09-01), Wiemer
patent: 4116791 (1978-09-01), Zega
patent: 4176003 (1979-11-01), Brower et al.
patent: 4382099 (1983-05-01), Legge et al.
patent: 4385946 (1983-05-01), Finegan et al.
patent: 4434036 (1984-02-01), Hoerschelmann et al.
patent: 4465529 (1984-08-01), Arima et al.
patent: 4481229 (1984-11-01), Suzuki et al.
patent: 4500563 (1985-02-01), Ellenberger et al.
patent: 4521441 (1985-06-01), Flowers
patent: 4539217 (1985-09-01), Farley
patent: 4565588 (1986-01-01), Seki et al.
patent: 4579618 (1986-04-01), Celestino et al.
patent: 4584026 (1986-04-01), Wu et al.
patent: 4698104 (1987-10-01), Barker et al.
patent: 4764394 (1988-08-01), Conrad
patent: 4778561 (1988-10-01), Ghanbari
patent: 4867859 (1989-09-01), Harada et al.
patent: 4871421 (1989-10-01), Ogle et al.
patent: 4892753 (1990-01-01), Wang et al.
patent: 4912065 (1990-03-01), Mizuno et al.
patent: 4937205 (1990-06-01), Nakayama et al.
patent: 4948458 (1990-08-01), Ogle
patent: 5040046 (1991-08-01), Chhabra et al.
patent: 5061838 (1991-10-01), Lane et al.
patent: 5074456 (1991-12-01), Degner et al.
patent: 5106827 (1992-04-01), Borden et al.
patent: 5107201 (1992-04-01), Ogle
patent: 5229305 (1993-07-01), Baker
patent: 5270250 (1993-12-01), Murai et al.
patent: 5277751 (1994-01-01), Ogle
patent: 5288650 (1994-02-01), Sandow
patent: 5290382 (1994-03-01), Zarowin et al.
patent: 5312778 (1994-05-01), Collins et al.
patent: 5354381 (1994-10-01), Sheng
patent: 5423945 (1995-06-01), Marks et al.
patent: 5435881 (1995-07-01), Ogle
patent: 5505780 (1996-04-01), Dalvie et al.
patent: 5510011 (1996-04-01), Okamura et al.
patent: 5514603 (1996-05-01), Sato
patent: 5520209 (1996-05-01), Goins et al.
patent: 5542559 (1996-08-01), Kawakami et al.
patent: 5561072 (1996-10-01), Saito
patent: 5569363 (1996-10-01), Bayer et al.
patent: 5571366 (1996-11-01), Ishii et al.
patent: 5572038 (1996-11-01), Sheng et al.
patent: 5587038 (1996-12-01), Cecchi et al.
patent: 5627435 (1997-05-01), Jansen et al.
patent: 5643838 (1997-07-01), Dean et al.
patent: 5648701 (1997-07-01), Hooke et al.
patent: 5653811 (1997-08-01), Chan
patent: 5654043 (1997-08-01), Shao et al.
patent: 5660895 (1997-08-01), Lee et al.
patent: 5665640 (1997-09-01), Foster et al.
patent: 5674321 (1997-10-01), Pu et al.
patent: 5683517 (1997-11-01), Shan
patent: 5711812 (1998-01-01), Chapek et al.
patent: 5718798 (1998-02-01), Deregibus
patent: 5770982 (1998-06-01), Moore
patent: 5885358 (1999-03-01), Maydan et al.
patent: 5888413 (1999-03-01), Okumura et al.
patent: 5897713 (1999-04-01), Tomioka et al.
patent: 5897752 (1999-04-01), Hong et al.
patent: 5911832 (1999-06-01), Denholm et al.
patent: 5935077 (1999-08-01), Ogle
patent: 5944942 (1999-08-01), Ogle
patent: 5948168 (1999-09-01), Shan et al.
patent: 5958140 (1999-09-01), Arami et al.
patent: 5985742 (1999-11-01), Henley et al.
patent: 5994207 (1999-11-01), Henley et al.
patent: 5994236 (1999-11-01), Ogle
patent: 5998933 (1999-12-01), Shun'Ko
patent: 6000360 (1999-12-01), Koshimizu
patent: 6013567 (2000-01-01), Henley et al.
patent: 6020592 (2000-02-01), Liebert et al.
patent: 6041735 (2000-03-01), Murzin et al.
patent: 6050218 (2000-04-01), Chen et al.
patent: 6076483 (2000-06-01), Shintani et al.
patent: 6096661 (2000-08-01), Ngo et al.
patent: 6101971 (2000-08-01), Denholm et al.
patent: 6103599 (2000-08-01), Henley et al.
patent: 6121161 (2000-09-01), Rossman et al.
patent: 6132552 (2000-10-01), Donohoe et al.
patent: 6139697 (2000-10-01), Chen et al.
patent: 6150628 (2000-11-01), Smith et al.
patent: 6153524 (2000-11-01), Henley et al.
patent: 6155090 (2000-12-01), Rubensson
patent: 6164241 (2000-12-01), Chen et al.
patent: 6165376 (2000-12-01), Miyake et al.
patent: 6174450 (2001-01-01), Patrick et al.
patent: 6174743 (2001-01-01), Pangrle et al.
patent: 6180496 (2001-01-01), Farrens et al.
patent: 6182604 (2001-02-01), Goeckner et al.
patent: 6187110 (2001-02-01), Henley et al.
patent: 6207005 (2001-03-01), Henley et al.
patent: 6237527 (2001-05-01), Kellerman et al.
patent: 6239553 (2001-05-01), Barnes et al.
patent: 6248642 (2001-06-01), Dolan et al.
patent: 6265328 (2001-07-01), Henley et al.
patent: 6291313 (2001-09-01), Henley et al.
patent: 6291938 (2001-09-01), Jewett et al.
patent: 6300643 (2001-10-01), Fang et al.
patent: 6303519 (2001-10-01), Hsiao
patent: 6305316 (2001-10-01), DiVergilio et al.
patent: 6321134 (2001-11-01), Henley et al.
patent: 6335536 (2002-01-01), Goeckner et al.
patent: 6339297 (2002-01-01), Sugai et al.
patent: 6341574 (2002-01-01), Bailey, III et al.
patent: 6348126 (2002-02-01), Hanawa et al.
patent: 6350697 (2002-02-01), Richardson et al.
patent: 6375790 (2002-04-01), Fenner
patent: 6387719 (2002-05-01), Mrvos et al.
patent: 6392351 (2002-05-01), Shunko
patent: 6395150 (2002-05-01), Van Cleemput et al.
patent: 6403453 (2002-06-01), Ono et al.
patent: 6410449 (2002-06-01), Hanawa et al.
patent: 6413321 (2002-07-01), Kim et al.
patent: 6417078 (2002-07-01), Dolan et al.
patent: 6418874 (2002-07-01), Cox et al.
patent: 6426015 (2002-07-01), Xia et al.
patent: 6432260 (2002-08-01), Mahoney et al.
patent: 6433553 (2002-08-01), Goeckner et al.
patent: 6453842 (2002-09-01), Hanawa et al.
patent: 6461972 (2002-10-01), Kabansky
patent: 6468388 (2002-10-01), Hanawa et al.
patent: 6492612 (2002-12-01), Taguchi et al.
patent: 6494986 (2002-12-01), Hanawa et al.
patent: 6514446 (2002-12-01), Hanawa et al.
patent: 6511899 (2003-01-01), Henley et al.
patent: 6513538 (2003-02-01), Chung et al.
patent: 6514838 (2003-02-01), Chan
patent: 6528391 (2003-03-01), Henley et al.
patent: 6559408 (2003-05-01), Smith et al.
patent: 6579805 (2003-06-01), Bar-Gadda
patent: 6582999 (2003-06-01), Henley et al.
patent: 6593173 (2003-07-01), Anc et al.
patent: 6643557 (2003-11-01), Miller et al.
patent: 6645828 (2003-11-01), Farrens et al.
patent: 6679981 (2004-01-01), Pan et al.
patent: 6747243 (2004-06-01), Reinhardt
patent: 6780759 (2004-08-01), Farrens et al.
patent: 6800559 (2004-10-01), Bar-Gadda
patent: 6811448 (2004-11-01), Paton et al.
patent: 6838695 (2005-01-01), Doris et al.
patent: 6887341 (2005-05-01), Strang et al.
patent: 2001/0042827 (2001-11-01), Fang et al.
patent: 2002/0047543 (2002-04-01), Sugai et al.
patent: 2003/0013260 (2003-01-01), Gossman et al.
patent: 2003/0013314 (2003-01-01), Ying et al.
patent: 2003/0029567 (2003-02-01), Dhindsa et al.
patent: 2003/0085205 (2003-05-01), Lai et al.
patent: 2003/0211705 (2003-11-01), Tong et al.
patent: 2004/0036038 (2004-02-01), Okumura et al.
patent: 2004/0092084 (2004-05-01), Rayssac
patent: 2004/0126993 (2004-07-01), Chan et al.
patent: 0 546 852 (1993-06-01), None
patent: 0 836 218 (1998-04-01), None
patent: 0 964 074 (1999-12-01), None
patent: 1 054 433 (2000-11-01), None
patent: 1 111 084 (2001-06-01), None
patent: 1 158 071 (2001-11-01), None
patent: 1 191 121 (2002-03-01), None
patent: 62290885 (1987-12-01), None
patent: 04318168
Al-Bayati Amir
Collins Kenneth S.
Gallo Biagio
Hanawa Hiroji
Monroy Gonzalo Antonio
Applied Materials Inc.
Arancibia Maureen G.
Hassanzadeh Parviz
Law Office of Robert M. Wallace
LandOfFree
Plasma immersion ion implantation apparatus including a... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma immersion ion implantation apparatus including a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma immersion ion implantation apparatus including a... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3650825