Plasma guard for chamber equipped with electrostatic chuck

Details Plasma guard for chamber equipped with electrostatic chuck Plasma guard for chamber equipped with electrostatic chuck

1994-10-18

1998-06-09

Niebling, John

Coating apparatus

Gas or vapor deposition

Work support

118723E, C23C 1600

Patent

active

057627142

ABSTRACT:
A plasma guard member that has the configuration of a flat concentric ring is used in a vacuum process chamber equipped with a plasma reaction chamber, a plasma source and a lower chamber which houses an electrostatic chuck for preventing charged particles from drifting or diffusing to the lower chamber and contact the electrostatic chuck such that the substrate holding capability of the chuck is not adversely affected.

REFERENCES:
patent: 5055964 (1991-10-01), Logan et al.

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