Etching a substrate: processes
Gas phase etching of substrate
Application of energy to the gaseous etchant or to the...
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Center gas feed apparatus for a high density plasma reactor
Clamp ring for domed pedestal in wafer processing chamber
Plasma guard for chamber equipped with electrostatic chuck
Plasma reactor with heated source of a polymer-hardening precurs
Plasma reactor with heated source of a polymer-hardening precurs
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Profile ID: LFUS-PAI-P-316891