Plasma device and plasma generating method

Details Plasma device and plasma generating method Plasma device and plasma generating method

2007-07-17

2007-07-17

Hassanzadeh, Parviz (Department: 1763)

Coating apparatus

Gas or vapor deposition

With treating means

C118S7230MA, C118S7230AN, C156S345360, C156S345410, C156S345420

Reexamination Certificate

active

10466602

ABSTRACT:
A plasma device includes a slot antenna (30) for supplying a high frequency electromagnetic field (F) supplied through a feeding part into a processing vessel (11). The feeding part has a cavity (35) for forming a resonator and converting the fed high frequency electromagnetic field (F) into a rotating electromagnetic field and supplying the rotating electromagnetic field to the slot antenna (30).

REFERENCES:
patent: 3899759 (1975-08-01), Hines et al.
patent: 4686494 (1987-08-01), Kaneko et al.
patent: 5134965 (1992-08-01), Tokuda et al.
patent: 5647944 (1997-07-01), Tsubaki et al.
patent: 5891252 (1999-04-01), Yokogawa et al.
patent: 5900699 (1999-05-01), Samukawa et al.
patent: 5954882 (1999-09-01), Wild et al.
patent: 6158383 (2000-12-01), Watanabe et al.
patent: 6222170 (2001-04-01), Tucker et al.
patent: 6355573 (2002-03-01), Okumura et al.
patent: 2000-073175 (1990-03-01), None
patent: 02-138735 (1990-05-01), None
patent: 03133201 (1991-06-01), None
patent: 0 674 334 (1995-09-01), None
patent: 09-102400 (1997-04-01), None
patent: 09-270386 (1997-10-01), None
patent: 10-012396 (1998-01-01), None
patent: 10-107011 (1998-04-01), None
patent: 11-195500 (1999-07-01), None
patent: 11-195500 (1999-07-01), None
patent: 11-297494 (1999-10-01), None
patent: 11-297494 (1999-10-01), None
patent: 2000012290 (2000-01-01), None
patent: 2000-073175 (2000-03-01), None
patent: 2000-223298 (2000-08-01), None
patent: 2000-223298 (2000-08-01), None
patent: 2000-323458 (2000-11-01), None
patent: 2000-357683 (2000-12-01), None
patent: 2000-357683 (2000-12-01), None
patent: 2001-223171 (2001-08-01), None
patent: 2001-345312 (2001-12-01), None
patent: 2002-060953 (2002-02-01), None
Denshi Zairyo, Mar. 2000, Dry Etching Apparatus With New Plasma Source “Pantheon Series”, pp. 69-73, 120.
English translation of PCT International Preliminary Examination Report.
Supplementary European Search Report for Application No. 02715809.6-2208 PCT/JP0200323, dated Feb. 10, 2006.
Yashiro et al , “Dry Etching Apparatus Equipped with a New Plasma Source” (“Atarashii Plasma Gen o Tosai shita Dry Etching Sochi”),Electronic Materials (Denshi Zairyo), vol. 39, No. 3, 2000, pp. 69-73.

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