Photostructuring method

Details Photostructuring method Photostructuring method

1992-03-10

1993-08-10

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430 11, 430270, 430312, 430313, 430396, G03F 740

Patent

active

052347940

ABSTRACT:
A simple method for diminishing the trench width in a photoresist structure to below the resolution limit is provided. A photoresist structure is produced and treated with an agent then contains a bulging constituent that reacts with functional groups of the photoresist structure. The bulging constituent causes a volume increase of the photoresist structure. The extent of the volume increase of the photoresist structures is controllable by varying various parameters.

REFERENCES:
patent: 4737425 (1988-04-01), Lin et al.
patent: 4751170 (1988-06-01), Mimura et al.
patent: 4945028 (1990-07-01), Ogawa

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