Photosensitive liquid precursor solutions and use thereof in mak

Details Photosensitive liquid precursor solutions and use thereof in mak Photosensitive liquid precursor solutions and use thereof in mak

1996-05-24

1998-08-11

Baxter, Janet C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

4302701, 430320, 430325, G03F 730

Patent

active

057925925

ABSTRACT:
A photosensitive liquid solution is used to make thin films for use in integrated circuits. The photosensitive liquid solution contains a photo initiator, and solvent, and a mixture of metals bonded to free-radical-susceptible monomers. The metals are mixed in amounts corresponding to the desired stoichiometry of a metal oxide thin film that derives from the. The photosensitive liquid solution is applied to a substrate, soft baked, and exposed to ultraviolet radiation under a photo mask. The ultraviolet radiation patterns the soft-baked film through a free radical polymerization chain reaction. A solvent etch is used to remove the unpolymerized portion of the polymerized film. The remaining thin film pattern is annealed to provide a patterned metal oxide film.

REFERENCES:
patent: 4332879 (1982-06-01), Pastor et al.
patent: 5021398 (1991-06-01), Sharma et al.
patent: 5519234 (1996-05-01), Paz de Araujo et al.
patent: 5627013 (1997-05-01), Kamisawa

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