Photolithographic method producing sub-micron patterns in the ma

Details Photolithographic method producing sub-micron patterns in the ma Photolithographic method producing sub-micron patterns in the ma

1988-01-07

1989-03-28

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430311, 430325, 430330, 430194, G03F 726

Patent

active

048163775

ABSTRACT:
A high-resolution photosensitive composition which can be plasma-developed, including an acrylic a polymer and a photosensitive compound, of the aromatic azide group, in which the polymer contains, in a side chain, at least one aromatic nucleus where at least one chlorine atom (Cl) has replaced at least one hydrogen atom (H), for example ##STR1##

REFERENCES:
patent: 4197133 (1980-04-01), Zweiful et al.
patent: 4205153 (1980-05-01), Weinstein
patent: 4262082 (1981-04-01), Rosenkranz
patent: 4284707 (1981-08-01), Nagasawa et al.
patent: 4386152 (1983-05-01), Lai
patent: 4468447 (1984-08-01), Kanai

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