Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2004-08-27
2009-11-10
Chea, Thori (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S325000, C430S328000
Reexamination Certificate
active
07615337
ABSTRACT:
A cap may be formed anisotropically over a photoresist feature. For example, a material, such as a polymer, may be coated over the photoresist feature. If the coated material is photoactive, the cap may be grown preferentially in the vertical direction, creating high aspect ratio structures in some embodiments of the present invention.
REFERENCES:
patent: 4615782 (1986-10-01), Namatsu et al.
patent: 6197687 (2001-03-01), Buynoski
patent: 6566280 (2003-05-01), Meagley et al.
patent: 6667210 (2003-12-01), Schneider et al.
patent: 2001/0003030 (2001-06-01), Jung et al.
Chandhok Manish
Goodner Michael D.
Leet Robert
McSwiney Michael
Meagley Robert P.
Chea Thori
Intel Corporation
Trop Pruner & Hu P.C.
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