Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2007-01-03
2010-02-02
Kik, Phallaka (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C700S098000, C700S120000, C700S121000, C430S005000, C378S035000, C250S492200, C250S492300
Reexamination Certificate
active
07657863
ABSTRACT:
A method for calculating area values of a pattern written by using a charged particle beam, includes virtually dividing a pattern into a plurality of mesh-like first square regions surrounded by first grids defined at intervals of a predetermined size, virtually dividing the pattern into a plurality of mesh-like second square regions surrounded by second grids defined at intervals of the predetermined size, wherein the second grids being positionally deviated from the first grids by a half of the predetermined size, distributing an area value of a sub-pattern in each of the second square regions to a plurality of apexes of each of the second square regions such that a center-of-gravity position of the sub-pattern does not change, wherein the sub-pattern being a part of the pattern, and outputting the distributed area values as area values, for correcting a proximity effect, defined at the center position of each of the first square regions.
REFERENCES:
patent: 5737250 (1998-04-01), Sawahata
patent: 2002/0095648 (2002-07-01), Saito
patent: 5-121303 (1993-05-01), None
patent: 08115888 (1996-05-01), None
patent: 9-186058 (1997-07-01), None
patent: 11015947 (1999-01-01), None
Iijima Tomohiro
Ise Masafumi
Kik Phallaka
NuFlare Technology, Inc.
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
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