Oxygen plasma clean to remove carbon species deposited on a...

Details Oxygen plasma clean to remove carbon species deposited on a... Oxygen plasma clean to remove carbon species deposited on a...

2007-01-23

2009-06-23

Ahmed, Shamim (Department: 1792)

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

C134S001100, C134S022100, C134S026000, C134S031000, C438S905000, C438S906000

Reexamination Certificate

active

07550090

ABSTRACT:
A method for in-situ cleaning of a dielectric dome surface having been used in pre-clean processes is provided. Carbon containing deposits are removed by providing a plasma of one or more oxidizing gases which react with the carbon containing films to form volatile carbon containing compounds.

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