Organosilane hardmask compositions and methods of producing...

Details Organosilane hardmask compositions and methods of producing... Organosilane hardmask compositions and methods of producing...

2006-12-08

2009-12-08

Norton, Nadine (Department: 1792)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C252S079100, C438S706000, C438S723000, C438S633000, C257S049000, C430S270100, C528S030000, C528S043000

Reexamination Certificate

active

07629260

ABSTRACT:
Provided herein are hardmask compositions that include an organosilane polymer prepared by the reaction of one or more compounds of Formula (I)in-line-formulae description="In-line Formulae" end="lead"?Si(OR1)(OR2)(OR3)R4in-line-formulae description="In-line Formulae" end="tail"?wherein R1, R2and R3may each independently be alkyl acetoxy or oxime; and R4may be hydrogen, alkyl, aryl or arylalkyl; andwherein the organosilane polymer has a polydispersity in a range of about 1.1 to about 2.

REFERENCES:
patent: 6602779 (2003-08-01), Li et al.
patent: 7288282 (2007-10-01), Graham et al.
patent: 2007/0185298 (2007-08-01), Baikerikar et al.
patent: 2007/0212886 (2007-09-01), Uh et al.
patent: 2000-0077018 (2000-12-01), None

Affiliated with

Also associated with

Rating

Organosilane hardmask compositions and methods of producing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Organosilane hardmask compositions and methods of producing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Organosilane hardmask compositions and methods of producing... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4084651