Optical scatterometry method of sidewall spacer analysis

Details Optical scatterometry method of sidewall spacer analysis Optical scatterometry method of sidewall spacer analysis

2006-08-15

2006-08-15

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By polarized light examination

Of surface reflection

C356S394000, C250S559240, C250S559420, C702S155000, C702S167000

Reexamination Certificate

active

07092096

ABSTRACT:
A method of analyzing structural characteristics of sidewall spacers fabricated on a wafer is disclosed. A grating bar having a plurality of grating targets is provided. A theoretical optical scatterometry spectrum is generated by subjecting the grating targets to optical scatterometry. An experimental optical scatterometry spectrum is generated by subjecting the sidewall spacers on the wafer to optical scatterometry. The structural characteristics of the sidewall spacers are equated with the structural characteristics of the grating targets when the theoretical optical scatterometry spectrum substantially matches the experimental optical scatterometry spectrum.

REFERENCES:
patent: 6639663 (2003-10-01), Markle et al.
patent: 6643008 (2003-11-01), Stirton et al.
patent: 6782337 (2004-08-01), Wack et al.

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