4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Combined with coating step

Fang-Chang Chen

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Method of etching a silicon containing layer using...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Optical scatterometry method of sidewall spacer analysis

Optics: measuring and testing – By polarized light examination – Of surface reflection
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Profile ID: LFUS-PAI-P-2773513

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