Nonvolatile semiconductor memory device having strap region...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S296000, C257S311000, C257S314000, C257SE27084, C257SE27091, C257SE21646, C257SE21660, C438S211000, C438S257000, C438S673000

Reexamination Certificate

active

11167793

ABSTRACT:
In a nonvolatile semiconductor memory device having a memory cell array region and a strap region for providing voltage to the memory cell array region, in the memory cell array region, a plurality of word lines and a plurality of source lines are formed in a row direction, and one source line is formed between two word lines. In the strap region, the word lines and the source lines extend in the row direction and are collinear with, and without separation from, the word lines and the source lines of the memory cell array region, and each of the word lines and the source lines has a word line contact and a source line contact.

REFERENCES:
patent: 6407941 (2002-06-01), Chevallier et al.
patent: 6483749 (2002-11-01), Choi et al.
patent: 6541324 (2003-04-01), Wang
patent: 6611062 (2003-08-01), Kurjanowicz
patent: 1998-0006326 (1998-03-01), None
patent: 1020010019754 (2001-03-01), None
patent: 2002-0097284 (2002-12-01), None
patent: WO 01/88985 (2001-11-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Nonvolatile semiconductor memory device having strap region... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Nonvolatile semiconductor memory device having strap region..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nonvolatile semiconductor memory device having strap region... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3843513

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.