Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2007-02-13
2007-02-13
Estrada, Michelle (Department: 2823)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C257S296000, C257S311000, C257S314000, C257SE27084, C257SE27091, C257SE21646, C257SE21660, C438S211000, C438S257000, C438S673000
Reexamination Certificate
active
11167793
ABSTRACT:
In a nonvolatile semiconductor memory device having a memory cell array region and a strap region for providing voltage to the memory cell array region, in the memory cell array region, a plurality of word lines and a plurality of source lines are formed in a row direction, and one source line is formed between two word lines. In the strap region, the word lines and the source lines extend in the row direction and are collinear with, and without separation from, the word lines and the source lines of the memory cell array region, and each of the word lines and the source lines has a word line contact and a source line contact.
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patent: 6483749 (2002-11-01), Choi et al.
patent: 6541324 (2003-04-01), Wang
patent: 6611062 (2003-08-01), Kurjanowicz
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patent: 1020010019754 (2001-03-01), None
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patent: WO 01/88985 (2001-11-01), None
Estrada Michelle
Jefferson Quovaunda
Mills & Onello LLP
Samsung Electronics Co,. Ltd.
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