Non-volatile memory device for 2-bit operation and method of...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257SE29309

Reexamination Certificate

active

07875921

ABSTRACT:
A non-volatile memory device for 2-bit operation and a method of fabricating the same are provided. The non-volatile memory device includes an active region and a gate extending in a word line direction on a semiconductor substrate, and crossing each other repeatedly; a charge storage layer disposed below the gate, and confined at a portion where the gate and the active region cross; a charge blocking layer formed on the charge storage layer; a tunnel dielectric layer formed below the charge storage layer; first and second source/drain regions formed in the active region exposed by the gate; and first and second bit lines crossing the word line direction. The active region may be formed in a first zigzag pattern and/or the gate may be formed in a second zigzag pattern in symmetry with the first zigzag pattern.

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“Non-Volatile Memory Device for 2-Bit Operation and Method of Fabricating the Same” Specification, Drawings, and Prosecution History of U.S. Appl. No. 11/376,518, filed Mar. 15, 2006 by Byung-yong Choi, et al., which is stored in the United States Patent and Trademark Office (USPATO) Image File Wrapper (IFW) system.

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