Non-volatile memory device and method of manufacturing the same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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C257S316000, C257SE21690

Reexamination Certificate

active

07972923

ABSTRACT:
A semiconductor device may include a tunnel insulating layer disposed on an active region of a substrate, field insulating patterns disposed in surface portions of the substrate to define the active region, each of the field insulating patterns having an upper recess formed at an upper surface portion thereof, a stacked structure disposed on the tunnel insulating layer, and impurity diffusion regions disposed at surface portions of the active region adjacent to the stacked structure.

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patent: 10-2004-0011656 (2004-02-01), None
patent: 10-2005-0066883 (2005-06-01), None
patent: 2006-0084106 (2006-07-01), None

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