Negative resist process with simultaneous development and...

Details Negative resist process with simultaneous development and... Negative resist process with simultaneous development and...

2006-02-14

2006-02-14

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S311000, C430S313000, C430S330000, C430S270100, C430S331000

Reexamination Certificate

active

06998215

ABSTRACT:
A process for producing amplified negative resist structures that includes exposing and contrasting of a resist then simultaneously developing and amplifying the resist to form the amplified resist structures. This substantially simplifies the production of amplified resist structures. Amplifying agents used include bicyclic or polycyclic compounds containing at least one reactive group for attachment to the resist polymer.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 5173393 (1992-12-01), Sezi et al.
patent: 5234793 (1993-08-01), Sebald et al.
patent: 5234794 (1993-08-01), Sebald et al.
patent: 6063549 (2000-05-01), Schadeli et al.
patent: 0 395 917 (1997-06-01), None
patent: WO 01/42860 (2001-06-01), None
Grant & Hackh, Chemical Dictionary, 1987, McGraw-Hill, Inc., 5th Edition, p. 22.

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