Negative crystalline photoresists for UV photoimaging

Details Negative crystalline photoresists for UV photoimaging Negative crystalline photoresists for UV photoimaging

1990-05-04

1991-10-29

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430313, 430323, 430325, G03F 736

Patent

active

050616048

ABSTRACT:
A described photo-sensitive system and process is useful as negative single layer photoresists with high resolution, high contrast, high sensitivity, long shelf life, and insensitivity to ambient light and allows large flexibility in the choice of polymer to be used.

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