Multiple-time flash anneal process

Details Multiple-time flash anneal process Multiple-time flash anneal process

2007-01-25

2009-12-08

Everhart, Caridad M (Department: 2895)

Semiconductor device manufacturing: process

Radiation or energy treatment modifying properties of...

By differential heating

C438S535000, C438S530000, C257SE21473, C257SE21454

Reexamination Certificate

active

07629275

ABSTRACT:
A method of forming an integrated circuit is provided. The method includes performing a multiple-time flash anneal process to a wafer, wherein the multiple-time flash anneal process comprises preheating the wafer to a first preheat temperature; performing a first flash on the wafer with a first flash energy; preheating the wafer to a second preheat temperature; and performing a second flash on the wafer with a second flash energy.

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