Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent
1997-04-07
1998-04-28
Font, Frank G.
Optics: measuring and testing
By configuration comparison
With photosensitive film or plate
356386, 356376, 356372, G01B 1128
Patent
active
057452393
ABSTRACT:
An apparatus and method of analyzing particles on an integrated circuit wafer using a quasi three dimensional image analysis of the particles. The apparatus includes an optical system which has an optical axis and forms an image of that part of a focal plane which within a field distance of the optical axis. The apparatus holds a wafer perpendicular to the optical axis and allows the surface of the wafer to be moved in a plane perpendicular to the optical axes to view the entire surface of the wafer. The apparatus also allows the surface of the wafer to be moved a step distance below the focal plane. Images formed at a number of step distances are used to form a quasi three dimensional image of particles on the surface of the wafer. Automatic image analysis is used when appropriate.
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Chen Bor-Cheng
Wann Yeh-Jye
Ackerman Stephen B.
Font Frank G.
Prescott Larry J.
Ratliff Reginald A.
Saile George O.
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