Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
Reexamination Certificate
2011-06-28
2011-06-28
Olsen, Allan (Department: 1716)
Etching a substrate: processes
Gas phase etching of substrate
With measuring, testing, or inspecting
C216S067000, C216S084000, C700S110000
Reexamination Certificate
active
07967995
ABSTRACT:
The invention provides a method of processing a substrate using multilayer processing sequences and Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models and libraries that can include one or more masking layer creation procedures, one or more pre-processing measurement procedures, one or more Partial-Etch (P-E) procedures, one or more Final-Etch (F-E) procedures, and one or more post-processing measurement procedures.
REFERENCES:
patent: 7894927 (2011-02-01), Funk et al.
patent: 2006/0037701 (2006-02-01), Koshiishi et al.
patent: 2009/0242513 (2009-10-01), Funk et al.
patent: 2010/0036514 (2010-02-01), Funk et al.
patent: 2010/0036518 (2010-02-01), Funk et al.
patent: 2010/0081285 (2010-04-01), Chen et al.
patent: 2010/0214545 (2010-08-01), Funk et al.
Funk Merritt
Lee Hyung Joo
Prager Daniel
Sundararajan Radha
Yamashita Asao
Olsen Allan
Tokyo Electron Limited
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