Monopolar electrostatic chuck having an electrode in contact wit

Details Monopolar electrostatic chuck having an electrode in contact wit Monopolar electrostatic chuck having an electrode in contact wit

1996-05-08

1998-04-28

Fleming, Fritz

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

H02N 1300

Patent

active

057453322

ABSTRACT:
A monopolar electrostatic chuck having a conductive pedestal base with a dielectric layer deposited thereupon. Upon the top surface of the dielectric layer is deposited a wafer spacing mask fabricated from a conduction material. The wafer spacing mask contains a plurality of support members that support a workpiece in a spaced apart relation with respect to said dielectric layer. At least one of said support members in said plurality of support members is adapted for connection to a power supply. The chucking voltage power supply is connected between the conductive pedestal base and the wafer support mask. In this manner, the workpiece is attracted to and thereby retained on the chuck without a plasma being generated proximate the wafer.

REFERENCES:
patent: 4502094 (1985-02-01), Lewin et al.
patent: 4554611 (1985-11-01), Lewin
patent: 4665463 (1987-05-01), Ward et al.
patent: 4897171 (1990-01-01), Ohmi
patent: 5001594 (1991-03-01), Bobbio
patent: 5656093 (1997-08-01), Burkhart et al.

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