Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent
1998-04-27
1999-11-09
Fleming, Fritz
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
279128, H02N 1300
Patent
active
059826070
ABSTRACT:
A monopolar electrostatic chuck having a conductive pedestal base with a dielectric layer deposited thereupon. Upon the top surface of the dielectric layer is deposited a wafer spacing mask fabricated from a conduction material. The wafer spacing mask contains a plurality of support members that support a workpiece in a spaced apart relation with respect to said dielectric layer. At least one of said support members in said plurality of support members is adapted for connection to a power supply. The chucking voltage power supply is connected between the conductive pedestal base and the wafer support mask. In this manner, the workpiece is attracted to and thereby retained on the chuck without a plasma being generated proximate the wafer.
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patent: 4554611 (1985-11-01), Lewin
patent: 4665463 (1987-05-01), Ward et al.
patent: 5103367 (1992-04-01), Horwitz et al.
patent: 5452177 (1995-09-01), Frutiger
patent: 5764471 (1998-06-01), Burkhart
Burkhart Vincent E.
Harvey Stefanie E.
Applied Materials Inc.
Fleming Fritz
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