Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1993-02-16
1995-03-28
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430270, 430272, 522904, G03C 500
Patent
active
054016142
ABSTRACT:
An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
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Dichiara Robert R.
Fahey James T.
Jones Pamela E.
Lyons Christopher F.
Moreau Wayne M.
Chapman Mark A.
Crockatt Dale M.
International Business Machines - Corporation
McCamish Marion E.
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