Methods of forming patterns in semiconductor devices using...

Details Methods of forming patterns in semiconductor devices using... Methods of forming patterns in semiconductor devices using...

2006-10-04

2009-06-30

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S328000, C430S329000, C430S331000, C430S942000, C382S149000

Reexamination Certificate

active

07553606

ABSTRACT:
Disclosed is a method of forming patterns in semiconductor devices by using photo resist patterns. These methods comprise forming photo resist patterns on a substrate. Inferior patterns are selected among the photo resist patterns. The inferior patterns are eliminated or shrunken by irradiating the selected inferior patterns with an electron beam.

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Office Action issued by Korean Intellectual Property Office on Feb. 21, 2007, corresponding to Korean Patent Application No. 10-2006-0016935.

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