Methods of forming integrated circuit devices including...

Details Methods of forming integrated circuit devices including... Methods of forming integrated circuit devices including...

2006-04-11

2006-04-11

Pham, Long (Department: 2814)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S106000

Reexamination Certificate

active

07026208

ABSTRACT:
An integrated circuit device includes a semiconductor substrate that has a cell region and a peripheral region that surrounds the cell region. A plurality of capacitors that include a plurality of lower electrodes, respectively, are disposed in the cell region. Supporters connect adjacent ones of the plurality of lower electrodes to provide structural support and stability to the lower electrodes.

REFERENCES:
patent: 2001-4798 (2001-01-01), None
patent: 2001-87943 (2001-09-01), None
patent: 2002-6333 (2002-01-01), None
Notice to Submit Response issued Feb. 28, 2004 for Korean Application No. 10-2002-0015385.

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