Methods for detecting transitions of wafer surface...

Details Methods for detecting transitions of wafer surface... Methods for detecting transitions of wafer surface...

2005-08-02

2005-08-02

Paladini, Albert W. (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C438S017000

Reexamination Certificate

active

06925348

ABSTRACT:
In chemical mechanical polishing, a wafer carrier plate is provided with a cavity for reception of a sensor positioned very close to a wafer to be polished. Energy resulting from contact between a polishing pad and an exposed surface of the wafer is transmitted only a very short distance to the sensor and is sensed by the sensor, providing data as to the nature of properties of the exposed surface of the wafer, and of transitions of those properties. Correlation methods provide graphs relating sensed energy to the surface properties, and to the transitions. The correlation graphs provide process status data for process control.

REFERENCES:
patent: 3874123 (1975-04-01), Hopkins et al.
patent: 4197676 (1980-04-01), Sauerland
patent: 4556845 (1985-12-01), Strope et al.
patent: 4600469 (1986-07-01), Fusco et al.
patent: 4793895 (1988-12-01), Kaanta et al.
patent: 5196353 (1993-03-01), Sandhu et al.
patent: 5240552 (1993-08-01), Yu et al.
patent: 5287663 (1994-02-01), Pierce et al.
patent: 5308438 (1994-05-01), Cote et al.
patent: 5337015 (1994-08-01), Lustig et al.
patent: 5413941 (1995-05-01), Koos et al.
patent: 5508077 (1996-04-01), Chen et al.
patent: 5559428 (1996-09-01), Li et al.
patent: 5597442 (1997-01-01), Chen et al.
patent: 5643050 (1997-07-01), Chen
patent: 5647952 (1997-07-01), Chen
patent: 5731697 (1998-03-01), Li et al.
patent: 5888120 (1999-03-01), Doran
patent: 5889401 (1999-03-01), Jourdain et al.
patent: 5916015 (1999-06-01), Natalicio
patent: 5938502 (1999-08-01), Kubo
patent: 5944580 (1999-08-01), Kim et al.
patent: 5958148 (1999-09-01), Holzapfel et al.
patent: 5969521 (1999-10-01), Kurita et al.
patent: 5972162 (1999-10-01), Cesna
patent: 5985094 (1999-11-01), Mosca
patent: 5993302 (1999-11-01), Chen et al.
patent: 6012964 (2000-01-01), Arai et al.
patent: 6030488 (2000-02-01), Izumi et al.
patent: 6056632 (2000-05-01), Mitchel et al.
patent: 6072313 (2000-06-01), Li et al.
patent: 6106662 (2000-08-01), Bibby, Jr. et al.
patent: 6110026 (2000-08-01), Arai
patent: 6146242 (2000-11-01), Treur et al.
patent: 6224461 (2001-05-01), Boehm, Jr. et al.
patent: 6375540 (2002-04-01), Mikhaylich et al.
patent: 6402589 (2002-06-01), Inaba et al.

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