Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2003-08-28
2008-09-09
Lund, Jeffrie R (Department: 1792)
Coating apparatus
Gas or vapor deposition
C118S724000, C156S345330
Reexamination Certificate
active
07422635
ABSTRACT:
The present disclosure suggests several systems and methods for batch processing of microfeature workpieces, e.g., semiconductor wafers or the like. One exemplary implementation provides a method of depositing a reaction product on each of a batch of workpieces positioned in a process chamber in a spaced-apart relationship. A first gas may be delivered to an elongate first delivery conduit that includes a plurality of outlets spaced along a length of the conduit. A first gas flow may be directed by the outlets to flow into at least one of the process spaces between adjacent workpieces along a first vector that is transverse to the direction in which the workpieces are spaced. A second gas may be delivered to an elongate second delivery conduit that also has outlets spaced along its length. A second gas flow of the second gas may be directed by the outlets to flow into the process spaces along a second vector that is transverse to the first direction.
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Basceri Cem
Beaman Kevin L.
Breiner Lyle D.
Doan Trung T.
Kubista David J.
Lund Jeffrie R
Perkins Coie LLP
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