Etching a substrate: processes
Masking of a substrate using material resistant to an etchant
Inventor
active
Methods and apparatus for forming submicron patterns on films
Methods and apparatus for forming submicron patterns on films
Process for producing antireflection coatings
No associations
LandOfFree
Ullrich Steiner does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with Ullrich Steiner, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ullrich Steiner will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-2449837