Methods and apparatus for e-beam treatment used to fabricate...

Details Methods and apparatus for e-beam treatment used to fabricate... Methods and apparatus for e-beam treatment used to fabricate...

2007-08-14

2007-08-14

Kebede, Brook (Department: 2823)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

C438S781000, C427S255280, C257S632000, C257SE23077

Reexamination Certificate

active

11045650

ABSTRACT:
One embodiment of the present invention is a method for fabricating a low-k dielectric film that included steps of: (a) chemical vapor depositing a lower-k dielectric film; and (b) e-beam treating the lower-k dielectric film.

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