Method of scanning a substrate, and method and apparatus for...

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Reexamination Certificate

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C250S306000, C250S307000, C250S311000

Reexamination Certificate

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07626164

ABSTRACT:
In an embodiment, a method of scanning a substrate, and a method and an apparatus for analyzing crystal characteristics are disclosed. A sequential scan on the scan areas using a first electron beam and a second electron beam are repeatedly performed. The electrons accumulated in the scan areas by the first electron beam are removed from the scan areas by the second electron beam. When a size of the scan area is substantially the same as a spot size of the first electron beam, adjacent scan areas partially overlap each other. When each of the scan areas is larger than a spot size of the first electron beam, the adjacent scan areas do not overlap each other. Images of the scan areas are generated using back-scattered electrons emitted from each of the scan areas by irradiating the first electron beam to analyze crystal characteristics of circuit patterns on the substrate.

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patent: 5892224 (1999-04-01), Nakasuji
patent: 6091249 (2000-07-01), Talbot et al.
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patent: 2005/0176159 (2005-08-01), Kang
patent: 2001-053122 (2001-02-01), None
patent: 2005-156516 (2005-06-01), None
patent: 10-0272124 (2003-08-01), None
patent: 2004-0065592 (2004-07-01), None
English language abstract for Korean Publication No. 2004-0065592.
English language abstract for Japanese Publication No. 2001-053122.
English language abstract for Japanese Publication No. 2005-156516.

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