Method of removing particle of photomask using atomic force...

Details Method of removing particle of photomask using atomic force... Method of removing particle of photomask using atomic force...

2007-06-19

2007-06-19

Wells, Nikita (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Positive ion probe or microscope type

C250S306000, C250S307000

Reexamination Certificate

active

11185657

ABSTRACT:
The kind of a particle is determined by pressing a hard atomic force microscope stylus having a spring constant equal to or larger than 300 N/m onto a particle to be removed and detecting bending quantity relative to a press force and a kind of a stylus used for removing the particle is changed in accordance with the kind of the particle.

REFERENCES:
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patent: 6289717 (2001-09-01), Thundat et al.
patent: 6452170 (2002-09-01), Zypman et al.
patent: 6583411 (2003-06-01), Altmann et al.
patent: 2002/0024004 (2002-02-01), Shimada et al.
patent: 2005/0150280 (2005-07-01), Tang et al.
patent: 2005/0247117 (2005-11-01), Shimada et al.

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