Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1995-05-25
1996-08-06
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427444, 427569, 427575, H05H 102
Patent
active
055431844
ABSTRACT:
A method and apparatus for reducing particulates in a plasma tool using steady state flows includes a device, operatively coupled to a housing in which an object to be processed is positioned, for generating a plasma flow adjacent the object toward a pumping aperture. A pumping mechanism pumps a medium adjacent the object. The medium supports the plasma and entrains particulates in the plasma away from the object and out the pumping aperture. Magnetic fields, produced by multipole magnets forming a ring cusp, are preferably used to produce the plasma flow which is directed radially away from the object to be processed. In a second embodiment, an array of magnets which form a line cusp is provided to produce an opening through which plasma will flow.
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Barnes Michael S.
Coultas Dennis K.
Forster John C.
Keller John H.
Wicker Thomas
International Business Machines - Corporation
Lam Research Corporation
Mortinger Alison P.
Pianalto Bernard
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