Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1999-01-25
2000-11-21
King, Roy V.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429806, C23C 1434
Patent
active
061497770
ABSTRACT:
An ion deposition sputtering process for producing a titanium nitride film having a resistivity less than about 70 .mu..OMEGA.-cm is disclosed, which comprises the steps of: (1) adjusting a percentage of ionization of a gas phase mixture to a predetermined range by adjusting the power to an ionization source; and (2) adjusting a deposition rate of said film on a substrate to a predetermined range so that a combination of said percentage of ionization of said deposition mixture and said deposition rate produces said film.
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Ngan Kenny King-Tai
Ramaswami Seshadri
Applied Materials Inc.
Church Shirley L.
King Roy V.
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