Method of producing a barrier layer in a semiconductor body

Details Method of producing a barrier layer in a semiconductor body Method of producing a barrier layer in a semiconductor body

1998-06-29

2000-08-08

Whitehead, Jr., Carl

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

438656, 438669, 438672, 438674, 438675, H01L 2144

Patent

active

061001872

ABSTRACT:
A barrier layer is formed on the contact plug of the semiconductor body. The barrier layer prevents oxidation of the contact plug. The barrier layer is produced by chemically reacting a prestructured metallic transition material with one or more reaction partners.

REFERENCES:
patent: 5212620 (1993-05-01), Evans, Jr. et al.
patent: 5506166 (1996-04-01), Sandhu et al.

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