Method of manufacturing capacitor for analog function

Details Method of manufacturing capacitor for analog function Method of manufacturing capacitor for analog function

1998-04-29

2000-06-13

Wilczewski, Mary

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

438250, 438252, 438393, 438396, 438631, 438692, 438633, 438253, H01L 2170, H01L 21302, H01L 21304

Patent

active

060749075

ABSTRACT:
A method of manufacturing a capacitor whose top and bottom electrodes have the nearly equal doping concentrations. In the method, a top surface of the capacitor top electrode is polished by a CMP (chemical mechanical polishing) and then doped using the same doping process as the capacitor bottom electrode, so that other elements can be isolated during the doping process. After forming the capacitor bottom electrode, thermal oxidation is performed so that the injected impurity ions of the capacitor bottom electrode are segregated toward a top surface portion thereof. With this method, a doping concentration at the top surface portion of the capacitor bottom electrode becomes higher than that at other portions thereof, and thereby the capacitor top and bottom electrodes may have a nearly same doping concentration at the interface therebetween.

REFERENCES:
patent: 5037772 (1991-08-01), McDonald
patent: 5429976 (1995-07-01), Hong et al.
patent: 5434098 (1995-07-01), Chang
patent: 5631188 (1997-05-01), Chang et al.
patent: 5670410 (1997-09-01), Pan

Affiliated with

Also associated with

Rating

Method of manufacturing capacitor for analog function does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing capacitor for analog function, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing capacitor for analog function will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2067927