Method of forming a transparent window in a polishing pad

Details Method of forming a transparent window in a polishing pad Method of forming a transparent window in a polishing pad

2005-06-28

2005-06-28

Wilson, Lee D. (Department: 3723)

Abrading

Precision device or process - or with condition responsive...

By optical sensor

C451S285000, C451S286000, C451S287000, C451S288000, C451S289000, C451S490000, C451S539000

Reexamination Certificate

active

06910944

ABSTRACT:
The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

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