Method of forming a pattern

Details Method of forming a pattern Method of forming a pattern

1991-06-07

1994-07-12

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430 5, 430396, G03C 500, G03F 900

Patent

active

053288076

ABSTRACT:
A comb-like or dot-like phase shifter pattern is added to a phase shifter used in phase shifting mask technology, which is then exposed onto a wafer. This enables the formation of extremely fine line patterns or space patterns having widths different from each other simultaneously. Further, when two reticles are disposed such that phase shifter patterns disposed therein intersect each other and are exposed consecutively onto a wafer, a fine hole pattern or dot pattern can be formed at a position where the phase shifter patterns intersect each other.

REFERENCES:
patent: 4665006 (1987-05-01), Sachdev
patent: 4775609 (1988-10-01), McFarland
patent: 4912018 (1990-03-01), Osuch
patent: 5045417 (1991-09-01), Okamoto
patent: 5091979 (1992-02-01), White
patent: 5122852 (1992-06-01), Chan

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