Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Layout generation
Reexamination Certificate
2011-05-03
2011-05-03
Doan, Nghia M (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Layout generation
C716S050000, C716S051000, C716S052000, C716S053000, C716S054000, C430S005000, C430S030000
Reexamination Certificate
active
07937676
ABSTRACT:
In positioning assist features on a photomask pattern to improve the image quality of the main features, the method includes deriving an h-function in a first process which represents a contribution of an assist feature with respect to image intensity at a main feature. In a continuation of the method, the position of the assist features are determined in a second process using the h-function derived in the first step. The assist features are then formed on the mask at the positions indicated. Also included is a computer readable medium having instructions for performing the h-function calculations, and the mask apparatus itself with both main and assist features positioned according to the h-function.
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Li, et al., Rapid search of the Optimum placement of assist feature to improve the aerial image gradient in iso-line structure, 2007, SPIE, pp. 1-7.
English language abstract of Korean Publication No. 2005-0069518.
Doan Nghia M
Muir Patent Consulting, PLLC
Samsung Electronics Co,. Ltd.
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