4. Computer-aided design and analysis of circuits and semiconductor
  5. Design of semiconductor mask or reticle
  6. Layout generation

Dong-Woon Park

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Auto focus system, auto focus method, and exposure apparatus...

Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate

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Interferometer systems for measuring displacement and...

Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate

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Method of arranging mask patterns and apparatus using the...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
Reexamination Certificate

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Method of arranging mask patterns and apparatus using the...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Layout generation
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

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Profile ID: LFUS-PAI-P-2273885

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