Method of and apparatus for measuring film thickness

Details Method of and apparatus for measuring film thickness Method of and apparatus for measuring film thickness

1996-07-09

1997-11-11

Evans, F. L.

Optics: measuring and testing

By configuration comparison

With photosensitive film or plate

25055927, G01B 1106

Patent

active

056869932

ABSTRACT:
A film thickness measuring apparatus measures the thickness of a thin film which is formed on a substrate with an excellent reproducibility regardless of inclination of a surface of a sample. Since an illumination system (20) includes a glass rod (GL) which corrects wavelength dependencies of luminance distributions of light sources (HL, DL), even when an eclipse in reflected light due to inclination of a sample (SP) decreases the energy of the reflected light, a spectral distribution of the reflected light entering a spectroscopic unit (40) is maintained with almost no change. A control unit (50) performs data conversion of multiplying an actual spectral reflectance by a ratio of an average of the actual spectral reflectance which is determined based on an output from the spectroscopic unit (40) to an average of a calibrated spectral reflectance and thereafter calculates a deviation between the two spectral reflectances. As a result, the film thickness is accurately measured while preventing an influence of inclination of the sample (SP).

REFERENCES:
patent: 5486701 (1996-01-01), Norton et al.

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