Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2004-04-05
2010-06-22
Cleveland, Michael (Department: 1792)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C427S248100, C427S249100, C427S249700, C427S255110
Reexamination Certificate
active
07740916
ABSTRACT:
A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 Å thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH3and H2S. The use of PH3and H2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 Å thick in a vacuum atmosphere such as found in an EUVL machine.
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Klebanoff, L .E.; Clift, W. M.; Malinowski, M. E.; Steinhaus, C.; Grunow, P.; Bajt, S.; “Radiation-induced protective carbon coating for extreme ultraviolet optics”, Mar./Apr. 2002, Journal of Vacuum Science & Technology, B: Microelectronics and Nanometer Structures, 20(2), 696-703.
Klebanoff, L .E.; Clift, W. M.; Malinowski, M. E.; Steinhaus, C.; Grunow, P.; Bajt, S.; “Radiation-induced protective carbon coating for extreme ultraviolet optics”, Mar./Apr. 2002, Journal of Vacuum Science & Technology, B: Microelectronics and Nanometer Structures, 20(2), 696-703.
Clift Wayne M.
Grunow Philip A.
Klebanoff Leonard E.
Cleveland Michael
EUV LLC.
Miller Michael G
Rutan & Tucker LLP
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