Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate
2006-12-18
2011-11-01
Ahmed, Shamim (Department: 1713)
Etching a substrate: processes
Gas phase etching of substrate
Application of energy to the gaseous etchant or to the...
C216S067000, C156S345460
Reexamination Certificate
active
08048328
ABSTRACT:
Methods for rotating a magnetic field in a process chamber is provided herein. In one embodiment, a method for rotating a magnetic field in a process chamber includes forming a magnetic field having a primary shape; changing the primary shape to at least two sequential transitional shapes; and changing the transitional shape to a rotated primary shape. Optionally, the magnetic field may be maintained at an approximately constant magnitude throughout each step. Optionally, a maximum of one current applied to one or more magnetic field producing coils is equal to zero or has its polarity reversed between any two adjacent steps.
REFERENCES:
patent: 5824607 (1998-10-01), Trow et al.
patent: 6113731 (2000-09-01), Shan et al.
patent: 7458335 (2008-12-01), Bjorkman
patent: 2002/0084255 (2002-07-01), Kanetsuki et al.
patent: 2003/0006008 (2003-01-01), Horioka et al.
patent: 2003/0085000 (2003-05-01), Horioka et al.
patent: 2003/0218427 (2003-11-01), Hoffman et al.
patent: 2003/0230385 (2003-12-01), Bach et al.
patent: 2004/0182516 (2004-09-01), Lindley et al.
patent: 2005/0167051 (2005-08-01), Hoffman et al.
patent: 2007/0066064 (2007-03-01), Kutney et al.
patent: 2007/0113980 (2007-05-01), Lindley et al.
European Search Report dated Apr. 3, 2009 for European Application No. 07122840.7.
European Search Report dated Apr. 3, 2009 for European Application No. 07122847.2.
Hoffman Daniel J.
Hogenson Scott A.
Lindley Roger A.
Ahmed Shamim
Applied Materials Inc.
Duclair Stephanie
Taboada Alan
Taboada Moser
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