Method for selectively exposing an uneven substrate surface

Details Method for selectively exposing an uneven substrate surface Method for selectively exposing an uneven substrate surface

1992-04-03

1994-03-08

Kight, III, John

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430323, 430327, 437225, 437228, 437229, 355 78, 156655, G03C 500

Patent

active

052926257

ABSTRACT:
A method and apparatus for selectively exposing an uneven substrate surface. The method can be used to remove a coating from the upper portions of the substrate surface by applying photoresist over the coating, placing a prism on the coated substrate, projecting light rays through the prism toward the substrate surface, removing either the exposed or unexposed photoresist, and removing the exposed coating.

REFERENCES:
patent: 3273999 (1966-09-01), Clark
patent: 4218302 (1980-08-01), Dalisa
patent: 4264149 (1981-04-01), De Zwart et al.
patent: 4670095 (1987-06-01), Negishi
patent: 4806442 (1989-02-01), Shiraski
patent: 4943126 (1990-07-01), Lang

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