Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2005-06-29
2009-08-18
Nguyen, Nam X (Department: 1795)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S298120, C204S298210, C204S298220, C204S298260, C204S298270
Reexamination Certificate
active
07575662
ABSTRACT:
The invention relates to a method for operating a magnetron sputter cathode, in particular a tube cathode or several tube cathodes forming an array. In such cathodes a target passes through a magnetic field, whereby induction currents flow in the target which distort the magnetic field. This results in the nonuniform coating of a substrate. By having the relative movement between magnetic field and target alternately reverse its direction, the effect of the magnetic field distortion can be compensated. This yields greater uniformity of the coating on a substrate to be coated.
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Machine Translation of Description section, EP 703599 A1, Dresse. Mar. 1996.
Wright, et al., “Design advances and applications of the rotatable cylindrical magnetron”, Journal of Vacuum Science and Technology: Part A., Amer. Instit. Of Physics. New York, (1986).
Bangert Stefan
Buschbeck Wolfgang
Hanika Markus
Keim Karl-Albert
Konig Michael
Applied Materials GmbH & Co. KG
Berman Jason M
Fulbright & Jaworski L.L.P.
Nguyen Nam X
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