Optics: measuring and testing – Shape or surface configuration – By focus detection
Reexamination Certificate
2005-02-01
2005-02-01
Rosenberger, Richard A. (Department: 2877)
Optics: measuring and testing
Shape or surface configuration
By focus detection
C356S237400, C356S237500
Reexamination Certificate
active
06850332
ABSTRACT:
A method and an apparatus for measuring a step difference in a semiconductor device without making contact with the semiconductor device. A first beam is radiated onto a wafer so as to form a first focus on a first portion of the wafer, and a second beam is radiated onto the wafer so as to form a second focus on a second portion of the wafer. The step difference between the first portion and the second portion of the wafer is measured by calculating a vertical displacement distance of the wafer and a beam focusing device used to attain the first focus and the second focus.
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Jun Chung-Sam
Kim Hyo-Hoo
Kim Kye-Weon
Yang Yu-Sin
Barth Vincent P.
Rosenberger Richard A.
Volentine Francos & Whitt PLLC
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